Pvd Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price
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...Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price Cr Sputtering Target Information Purity: 99.5-99.95%; Circular: Diameter <= 14 inch, Thickness >= 1mm; Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm; Targets Type: Planar sputtering target, Rotary sputtering target, Acr cathode Chromium is silver white metal, extremely hard and corrosion-resistant. Metal chromium......
JINXING MATECH CO LTD
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3N5 127*458*10mm Chromium Sputtering Target Plate Shape
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...port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Chromium (Chromium), chemical symbol Cr, atomic number 24, in the periodic table belongs to group ⅵ B. The element name comes from the Greek word for "color," because chromium compounds are...
Baoji Feiteng Metal Materials Co., Ltd.
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High Purity Cr Chromium Sputtering Target Plate Shape For PVD Coating Machine
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Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Pvd Titanium Sputtering Target Metal Target Customized
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.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can...
Baoji Lihua Nonferrous Metals Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
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DIN2462 Stainless Steel Tubing For Planar Sputtering Target
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ......
TORICH INTERNATIONAL LIMITED
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