pvd sputtering targets

Brand Name:JXS

Place of Origin:China

...Pvd Sputtering Vacuum Coating Machine The Physical Vapor Deposition (PVD) coating machine is a technologically advanced equipment used to apply thin, durable coatings to various substrates. It operates in a vacuum environment to deposit materials such as metals, ceramics, or alloys onto surfaces through processes like sputtering...

Brand Name:LHTi

Model Number:Titanium target

Place of Origin:China

...Sputtering Titanium Target/titanium Sputter Target/vacuum Coating Titanium Target 1. Product Information Product name ASTM B381 gr2 gr5 gr9 gr12 titanium target Dia 3'' 4'' chemical industry Grade Gr1/Gr2/Gr5/Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target...

Brand Name:JINXING

Model Number:Nickel Sputtering Target

Place of Origin:China

Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and ...

Brand Name:JINXING

Model Number:Aluminum Sputtering Target

Place of Origin:China

Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...

Brand Name:JINXING

Model Number:Aluminum Plate Sputtering Target

Place of Origin:China

Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...

Brand Name:JINXING

Model Number:Nickel Plate Sputtering Target

Place of Origin:China

Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...

Brand Name:JINXING

Model Number:Titanium Sputtering Target

Place of Origin:China

Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high ...

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, ...

Brand Name:JINXING

Model Number:high purity Titanium Sputtering Target

Place of Origin:China

High purity Titanium Sputtering Target 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and ...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Brand Name:CSTI

Model Number:Dental Implants Titanium Discs-20230607

Place of Origin:China

Dental Implants Titanium Discs metal sputtering target teeth crown or bridge It is suitable for CAD/CAM cutting and engraving mechanism for full crown, inner crown, post core and fixed bridge. Gr2 Dental pure titanium disc, due to high purity, low hardness...

Categories:Sputtering Target

Country/Region:china

Samarium sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal ...

Brand Name:ROYAL

Model Number:RTAS1612

Place of Origin:Made in China

...Sputtering System / Vacuum Flask PVD Cooper Deposition Thanks for the Magnetron Sputtering Technology which represents a real alternative to definitively substitute Chrome/Silver/Gold electroplating coating onto metals/ceramics/ resin/plaster/glass and plastic materials which is considered to be a strong pollutant and a health hazard. The most important is the added value brings to producers. The Sputtering PVD

Brand Name:ROYAL

Model Number:RTAS1612

Place of Origin:Made in China

...Sputtering System / Vacuum Flask PVD Cooper Deposition Thanks for the Magnetron Sputtering Technology which represents a real alternative to definitively substitute Chrome/Silver/Gold electroplating coating onto metals/ceramics/ resin/plaster/glass and plastic materials which is considered to be a strong pollutant and a health hazard. The most important is the added value brings to producers. The Sputtering PVD

Brand Name:LHTi

Model Number:Titanium Disk

Place of Origin:Baoji, Shaanxi, China

... advanced materials to enhance the performance, safety, and durability of medical devices. Among these materials, high purity titanium sputtering targets have gained significant importance due to their unique properties and versatility. This article will

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

Sputtering Target Metal Target and Titanium Target Cylinders Customized for the Medical Industry In the medical industry, the demand for high-quality materials that ensure safety, effectiveness, and durability is paramount. Among these materials, sputtering targets—particularly metal and titanium targets—have gained significant importance due to their unique properties and versatility. These targets...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...sputtering target for Chemcial industrial Product name: Titanium Sputtering Target Materail: Pure Titanium Gr2 or titanium alloy Gr5 , Ti-Al , Ti-Cr, Ti-Zr etc. Other material: Chrome, Zirconium , Copper , tungsten etc. Shape: Round Dimensions: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T) ,can be customized Application: Coating industry, sputtering...

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,