titanium sputtering target

Brand Name:JINXING

Model Number:Nickel Sputtering Target

Place of Origin:China

Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and ...

Brand Name:JINXING

Model Number:Aluminum Sputtering Target

Place of Origin:China

Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...

Brand Name:JINXING

Model Number:Aluminum Plate Sputtering Target

Place of Origin:China

Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...

Brand Name:JINXING

Model Number:Nickel Plate Sputtering Target

Place of Origin:China

Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, ...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Categories:Sputtering Target

Country/Region:china

Samarium sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Model Number:Molybdenum Rotatable Sputtering Target

...Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: 99.95% Molybdenum Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets...

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Rotary Sputtering Target For Magnetron Target 1. Description Of Molybdenum Rotary Sputtering Target For Magnetron Target: The molybdenum rotary sputtering target is a magnetron target, which is usually made into a cylindrical shape with a ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets...

Brand Name:Forged

Place of Origin:Luoyang

Model Number:customized

...sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium...

Brand Name:JINXING

Model Number:High Purity Tungsten Sputtering Target for Thin Film Industry

Place of Origin:CHINA

...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99.95%; Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040'' Block: Length ≤ 32 inch, Width ≤ 12 ...

Model Number:Mo1 Molybdenum Plate

... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed.

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Model Number:Molybdenum Planar Sputtering Targets

High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and ...