pvd sputtering targets

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...Target Cylindirc PVD sputtering target 100x40mm 300x40mm Titanium target is mainly used in mechanical equipment, electronic equipment, electroplating equipment, aviation, medical, a variety of precision mechanical and electrical industries. Product name:Titanium sputtering target...

Brand Name:JINXING

Model Number:Zirconium Target

Place of Origin:China

... field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium Cylindrical Sputtering Target Description We offer a wide range of ceramic and metallic sputter targets,in

Brand Name:Zirconium Sputtering Targets, High Quality Cylindrical Targets

Model Number:plates

Place of Origin:China

...Sputtering Targets, High Quality Cylindrical Targets Zirconium Sputtering Targets Description Zirconium Sputtering Targets (Zr) is a silver metal with a density of 6.52 g/cm3. Zirconium has a very small neutron adsorption cross section and relatively high melting point (1855°C or 3371°F), making it an excellent material for nuclear power rods. Zirconium sputtering targets and arc cathodes have been widely used in the field of PVD

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

...Sputtering Target For PVD Coating Gr1 Gr2 Gr5 TiAl titanium alloy Titanium Sputtering Target For PVD coating ​1.The target material The target material is the target material bombarded by high-speed charged particles. There are metals, alloys, oxides, etc. Replace different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets...

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can

Brand Name:High Purity Titanium Aluminium Zirconium Chrome Sputtering Target

Model Number:plates

Place of Origin:China

...Sputtering Target We produce Titanium Aluminium Zirconium Chrome Sputtering Target high quality sputtering targets pure metal, alloy and ceramic materials. FANMETAL Produces high-purity pure metal and alloy sputtering targets with the highest density and smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD...

Brand Name:Changsheng

Model Number:ASTM

Place of Origin:China

Description Titanium Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4....

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

Ti Titanium Sputtering Target High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine In the realm of advanced materials, titanium sputtering targets are pivotal in the production of high-performance coatings used in various applications...

Brand Name:Zirconium Sputtering Target for Thin Film Coating

Model Number:plates

Place of Origin:China

...Sputtering Target for Thin Film Coating We specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target...

Brand Name:Changsheng

Model Number:ASTM B348

Place of Origin:China

...Sputtering targets are source materials used to deposit thin films through the sputtering process. These targets are manufactured by processing metals or ceramics through techniques such as melting, sintering, and precision machining. We provide sputtering targets made from a wide range of materials, purities, and shapes. By combining advanced technologies in material synthesis and mechanical processing, we can produce targets

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...molybdenum rotary target. Molybdenum target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, ion coating and other ...

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

...PVD Titanium Sputtering Targets Customized for Medication In the realm of advanced medical technology, the use of high purity titanium sputtering targets has gained significant attention. These targets, essential for Physical Vapor Deposition (PVD) processes, are vital for creating thin films that are used in various medical applications. With purity levels ranging from 99.5% to 99.995%, high purity titanium sputtering targets...

Brand Name:LHTi

Model Number:LH-Target

Place of Origin:Baoji, China

.... Among these materials, Grade 5 and Grade 7 titanium sputtering targets stand out for their exceptional properties and versatility. These high purity PVD (Physical Vapor Deposition) titanium sputtering targets are specifically designed to meet the

Brand Name:Jinxing

Model Number:Sputtering Target Titanium-Aluminum

Place of Origin:China

Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool coatings and decorative coatings. Compared with the melting process, the TiAl target prepared by the HIP process has a more uniform microscopic internal structure and a smaller grain size, which is suitable for various magnetron sputtering machines and ion coating machines. In the PVD...

Brand Name:Changsheng

Model Number:ASTM

Place of Origin:China

... target products of a variety of materials, purities and shapes, by combining our technologies of melting, sintering, synthesis and mechanical processing together. Selection of a fabrication method and ...

Brand Name:Changsheng

Model Number:ASTM F67,ASTM F136 ASTM B381

Place of Origin:China

...Sputtering targets are materials used to grow thin films by the sputtering process. These targets are fabricated from high-purity metals or ceramics through advanced melting, sintering, synthesis, and precision machining techniques. We provide sputtering targets...

Brand Name:Changsheng

Model Number:ASTM B348

Place of Origin:China

Description Sputtering targets are materials from which thin films are grown using the sputtering method. These targets are fabricated by processing metals or ceramics. We provide sputtering target products in a wide variety of materials, purities, and ...

Brand Name:Changsheng

Place of Origin:China

Model Number:Ti,Ti-Al, Zr, Cr. etc.

Description Sputtering targets are materials from which thin films are grown by a sputtering method. These targets are fabricated by processing metals or ceramics. We offer sputtering target products in a wide range of materials, purities, and shapes by ...

Brand Name:JINXING

Model Number:Titanium Sputtering Target

Place of Origin:China

...smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Specification Composition Ti Purity CP Grade 2 (99.5%), CP Grade 1 (99.7%), 3N5 (99....